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Home > Anterior Cervical Plating Systems > CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
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CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating

CVD Ald Atomic Layer Deposition System for Powder Coating Plating

Customization: Available
After-sales Service: Onlin
Warranty: 1
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Product Description

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Basic Information

Model NO.
CY-ALD
Type
Coating Production Line
Coating
Vacuum Coating
Certification
CE
Condition
New
Wafer Dimension
8 Inch and Below
Wafer Temperature
Rt-400c, Precision +-0.1c
ALD Valve
Swagelok ALD Swift Valve
Gas Carrier System
N2 or Ar
Production Capacity
200 Sets Per Month
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Product Description

CVD ALD Atomic Layer Deposition System for Powder Coating Plating

Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization. The electric of the system completely accords with the CE criterion, widely used in fields of micro-electronics, nano material, optical film, solar battery, etc.

Product Benefits:

  • Advanced software controlling system with integrated technological formulation.
  • Comprehensive parameter setting and interlocking alarming.
  • State supervisory control and popedom setting.

Supported ALD Films:

Elementary: Co, Cu, Ta, Ti, W, Ge, Pt, Ru, Ni, Fe...
Nitride: TiN, SiN, AlN, TaN, ZrN, HfN...
Oxide: TiO2, HfO2, SiO2, ZnO, ZrO2, Al2O3...
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Technical Parameters

Wafer Dimension8 inch and below
Wafer TemperatureRT-400ºC, Controlling precision ±0.1ºC
Number of PrecursorThree precursor lines, optional more lines
Temperature of Precursor LinesRT-200ºC, Controlling precision ±0.1ºC
ALD ValveSwagelok ALD swift valve
Background Vacuum<5*10-3Torr
Growing ModeConsecutive or interval deposition mode
Deposition HeterogeneityHeterogeneity <±1%
Power Supply50-60Hz, 220V/20A AC
Dimensions600mm x 600mm x 1100mm
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Detailed Photos

ALD System 1
ALD System 2
ALD System 3
ALD System 4
ALD System 5
ALD System 6
ALD System Banner
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Frequently Asked Questions

Are you a manufacturer or a trading company?
We are professional laboratory instrument manufacturers. We have our own design team and factory, with mature technical experience to guarantee product quality and optimal pricing.
How is the product after-sales service system?
The product warranty period is 12 months, and we provide lifetime maintenance. Our professional pre-sales and after-sales departments respond within 24 hours to resolve technical issues.
How long is the delivery time for standard or custom instruments?
For in-stock goods, it takes 5-10 days. For customized services, it usually takes 30-60 days depending on the specific specifications of the instrument.
How do you handle different power supplies and plugs?
We can supply transformers and plugs according to your local requirements and the power standards of different countries.
What are the available payment methods?
We accept T/T, L/C, D/P, and other methods. Using Trade Guarantee is often recommended for security.
How are the goods packaged and delivered?
We use standard export fumigation wooden box packaging. Delivery can be made via express, air, or sea shipping based on customer requirements.

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